Titanium Nitride (TIN) is usually obtained in two ways.
Titanium Nitride (TIN) is usually obtained in two ways.
Properties of Huinano-titanium nitride (TiN) coatings
Film thickness: <=8um
Friction coefficient: <0.4
Film hardness: =<25GPa (~HV2500)
Maximum operating temperature: 600°C
Film color: golden
Process temperature: 180~400°C
Coating structure: nano monolayer/composite
There are usually two ways to obtain Titanium Nitride (TIN), the first is magnetron sputtering and the second is Cathode ARC. Both methods have advantages and disadvantages. The coating obtained by magnetron sputtering has low hardness, but fine particles and good surface finish. The coating obtained by imprinting ARC has high surface hardness but large particle size and many surface defects, so it usually needs to be polished after plating.